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安捷倫推行可明顯擴大原子力顯微鏡能力的新控制器 安捷倫科技有限公司宣布推行Magnetic AC Mode III控制器，此控制器是一款特殊的用于要求高解決方案和力量敏感性的領域中，如：生物學、聚合體和表面科學。在支持區(qū)域內的技術上建造，這一平和的，非破壞性的原子力顯微鏡（AFM）技術是為在活體或是空氣中成像而設計的。 安捷倫業(yè)務經理Jeff Jones說：“新套由MAC Mode III提供的能力提高了我們的納米技術測量儀器的有效性，更好地使研究員定制他們實驗所需要的設備。這次技術的推行更強調了我們要為滿足和超越顯現應用的責任。” MAC Mode III提供三個占據放大器的可配置用戶，給研究員提供多功能、高精確度和快速記時功能。其擁有寬闊的操作頻率范圍可達6 MHz，可幫助科學家們研究高次模。內置的Q控制進一步加強了諧振峰值。高次成像能提供相對照的超過基本振幅和相位信號的圖像，允許科學家們收集關于事例的外觀面的機械性能的附加消息 安捷倫MAC Mode III允許一個或多波段KFM通過。同時地，高精度地形和表面電勢測量由一個在高處支起的伺服系統(tǒng)完成。KFM/EFM為測量介電薄膜、具有金屬表面的物體、壓電體和絕緣體提供極好的使用性。 安捷倫Mode III可與環(huán)境控制、溫度控制、電氣化學控制和同步操作。安捷倫的聲學AC模塊也包含在MAC Mode III中。 original text [COLOR=#708090]Agilent Technologies Introduces New Controller that Significantly Extends Atomic Force Microscopy Capabilities. Agilent Technologies Inc. today introduced the Magnetic AC Mode III （MAC Mode III） controller, which is particularly useful in areas that require high resolution and force sensitivity, such as biology, polymers and surface science. Built on field-proven technology, this gentle, nondestructive atomic force microscopy （AFM） technique is designed for imaging delicate samples in liquid or air. "The new set of capabilities provided by MAC Mode III greatly enhances the utility of our nanotechnology measurement instruments, better enabling researchers to customize their experiments," said Jeff Jones, operations manager for Agilent’s AFM facility in Chandler, Ariz. "The introduction of this technology underscores our commitment to meet and exceed the demands of emerging applications." MAC Mode III offers three user-configurable lock-in amplifiers, affording researchers versatility, higher accuracy and quicker time to results. It has a wider operating frequency range —— up to 6 MHz —— enabling scientists to investigate higher harmonic modes. Built-in Q control further enhances the resonance peak. Higher harmonic imaging provides contrast beyond that seen with fundamental amplitude and phase signals, allowing scientists to collect additional information about mechanical properties of the sample surface. The Agilent MAC Mode III allows one-pass multi-channel detection for Kelvin force microscopy （KFM） and electric force microscopy （EFM）. Simultaneous, high-accuracy topography and surface potential measurements are facilitated by a servo-on-height cantilever approach that is not susceptible to scanner drift. KFM/EFM offers excellent utility for measuring dielectric films, metal surfaces, piezoelectrics and conductor-insulator transitions. MAC Mode III can be operated simultaneously with environmental control, temperature control, electrochemical control and controlled fluid exchange. Agilent’s acoustic AC mode is included with MAC Mode III.[/COLOR]